CVD Equipment Corporation designs, develops, and manufactures process equipment solutions for R&D, pilot, and production applications. Our products include a complete array of turnkey solutions such as chemical vapor deposition systems, gas & liquid delivery cabinets, gas panels, and related gas abatement systems. CVD Equipment Corporation’s headquarters and application laboratory are located on Long Island, New York, USA.

Our R&D and Production Systems include:

• Atomic Layer Deposition (ALD) Systems
• Atmospheric Pressure CVD (APCVD) Systems
• Semiconductor Crystal Growth Systems
• Chemical Vapor Infiltration (CVI) Systems
• High Temperature Annealing (HTA) Systems
• Hydride Vapor Phase Epitaxy (HVPE) Systems
• Low Pressure CVD (LPCVD) Systems
• Liquid Phase Epitaxial (LPE) Reactor Growth
• Metal Organic CVD (MOCVD) Systems
• Plasma Enhanced CVD (PECVD) Systems
• Rapid Thermal Processing (RTP) & Rapid Thermal
• Annealing (RTA) Systems
• Selenization and Sulfurization (SAS) Systems

Our Production System Technology Capabilities include:

• Automation
• Cluster Tools
• Dry Etching
• Exhaust Abatement
• Multi-Chamber Tools
• Reel-to-Reel (Roll-to-Roll)
• Vacuum Caoting

Our equipment is used worldwide for cutting edge research and high volume production for many applications such as:

• Aerospace Components
• Medical Implants
• Military
• Semiconductor/MEMS
• Solar Photovoltaics
• Nanomaterials
• Optoelectronics
• Glass Coatings
• Functional Coatings
• TCO Coatings